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ADVANCED PULSING POWER

ADVANCED PULSING POWER
ADVANCED PULSING POWER

AE disrupted the dual-magnetron sputtering paradigm by introducing bipolar pulsed-DC technology, providing unprecedented plasma control where only limited control previously existed. Ascent® AP power supplies further extend your ability to optimize output by introducing additional control parameters in a compact solution for dual- and now also single-magnetron sputtering. With patented pulsing technology, the Ascent AP solution proactively inhibits arcs, and its wide operational range unlocks a range of material options to extend process flexibility and material innovation.
Model: ASCENT AP
Nhà sản xuất: Advanced-Energy

Features

     -     Advanced waveform customization for expanded access to power delivery parameters

-       Patented pulsing technology for remarkable arc prevention, higher power levels, and increased throughput

-       Compact, single-unit solution (up to 30 kW)

-       Set point compensation™ technology for stable throughput

-       Wide operational range to enable a variety of process materials

-       Precise sputtering of dielectric and conductive films

-       Single-magnetron and dual-magnetron configurations available

-       Extended process control, flexibility, and innovation

-       High film quality and throughput

-       Repeatable, customizable films

-       Higher power levels with reduced arc damage

-       Easy integration and control

Benefits

  -       Precise sputtering of dielectric and conductive films

-      Extended process control and flexibility

-      High film quality and throughput

-      Repeatable, customizable films

-      Higher power levels with reduced arc damage

-      Easy integration and control

General Specifications



Doawload catalogue:  Ascent ap

Condition: Availibale

Contact to have the best cost: +84(0) 83 833 1313

 




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