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REMOTE PLASMA SOURCE

REMOTE PLASMA SOURCE
REMOTE PLASMA SOURCE

The Rapid OX is the perfect RPS for oxygen processes due to its unique user-insertable and removable quartz chamber liner. The liner reduces recombination of oxygen, ensuring effective transportation of reactive species to the process chamber. With 6kW of power, the Rapid OX dissociates oxygen with variable frequency and power control for optimal performance. The removable and replaceable quartz liner reduces downtime and significantly lowers replacement costs when compared to products with full quartz chambers, leading to better tool utilization, reduced particulate matter and overall lower cost of ownership
Model: RAPID OX
Nhà sản xuất: Advancedenergy

PRODUCT HIGHLIGHTS
RAPID OX
REMOTE PLASMA SOURCE FOR OXYGEN-BASED PROCESSES
Variable frequency tuning and precise
power control enables repeatable,
controllable processes
Highly-reliable chamber design and
cooling system improves chamber
lifetime and reduces service costs
High dissociation rate and
high-density radical generation for
improved process performance
Thermal management in the chamber
ensures long, reliable performance
Resultant reactive species longer
lifetime provides improved
photoresist strip rates as compared to
anodized chamber walls
Rapid OX ignites and reaches steady
state operation rapidly due to low
dynamic pressure overshoot
 

TYPICAL APPLICATIONS
Photoresist ashing
Wafer pre-clean
Carbon chamber clean processes
Parameter Specifications
Plasma Power Range 500 W to 6000 W with power leveling capability within the power supply impedance range
Process Applications Remote delivery of gases for downstream chamber cleaning, reactive etching processes, and reactive
deposition processes
Ignition 100 mTorr to 1 Torr of Oxygen and Nitrogen up to 4 SLM (90% O2 and 10% N2)
Chemical Compatibility This unit is intended for use with selected gases such as Ar, O2, H2, N2, F2, H2O, NF3 or O2:CxFy
Consumables No consumables under O2 and N2 operation
Flows, Dilutions and Pressure
Range during Operation
The verified operating flow range of the unit is 0.2 to 4 SLM of pure O2, and O2 with a 10% N2 between
100 mTorr and 4 Torr.
Other gas pressure / flow combinations may be permitted but must be approved by Advanced Energy
prior to use.
RF Frequency 250 to 665 kHz
Power Accuracy Referenced at plasma load +/- 5% or 200 W whichever is greater
Operational Load Limits Minimum power: 500 W
Maximum power: 600 W
Maximum plasma voltage: 325 Vrms
Minimum plasma current: 5 Arms
Maximum primary current: 120 Arms

 




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